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RUBICAD Receives
the Most Informative Presentation Award at the Custom Integrated Circuit
Conference 2002
Presentation outlining the solution for solving the most pressing design problems will be repeated at Design Automation Conference New Orleans in June. San Jose,
CA, May 15, 2002..... RUBICAD Corporation, a world-leading EDA supplier
of layout manipulation and optimization tools for physical circuit designs,
was awarded first prize for the most informative presentation at the Custom
Integrated Circuit Conference in Orlando from May 13-14, 2002. Michael
Reinhardt, President and CEO of RUBICAD discussed how to solve the most
pressing design problems through Automatic Layout Modification (ALM) on
the physical design level.
Solving
design problems on the physical level
For several years, ASIC engineers have been plagued by timing problems in ultra deep sub-micron technologies. Timing closure is more difficult to achieve in deep sub-micron processes. The reasons are well known - the relation between wire delay and gate delay is increasing. Wire delays are becoming much larger than gate delays. RUBICAD’s ALM technology provides an automatic solution for adjusting designs post-layout and solving the majority of timing problems. Another main concern for ASIC designers is signal integrity. In 0.13 technologies most designs are affected by crosstalk. This is because of lower supply voltage levels, faster circuit speeds and larger wire capacitances. Noise levels, which were uncritical before, have suddenly become critical and now have an adverse effect on circuit timing and functionality. RUBICAD’s ALM technology helps to modify the physical design so that signal integrity problems can be avoided. Yet another challenge for designers is power. Power consumption is thought to be controlled best at the architectural level. However, improvements in power reduction can be successfully achieved by modifying the physical design using RUBICAD’s ALM technology. RUBICAD’s
ALM technology can also be applied towards yield improvement. Recent semiconductor
data revealed that yields are only 50% - 60% in 0.13 micron technologies.
This is significantly lower than the 90% plus designers were used to in
0.18 and 0.25 micron technologies.
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